Flow control valve for use in fabrication of semiconductor devic

Coating apparatus – Gas or vapor deposition

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

13762541, C23C 1600

Patent

active

056016514

ABSTRACT:
A fluid switching valve comprises a valve box and a rotary valve element. The valve box is provided with a plurality of fluid inlets and a single fluid outlet connected with each other by a fluid passage, wherein the rotary valve element is formed to block the fluid passage for an arbitrary rotational angle of the valve element, by engaging with an inner wall of the fluid passage. The valve element carries on an outer surface thereof a plurality of grooves in correspondence to the plurality of fluid inlets, wherein each of the grooves has a cross sectional area that changes from a first end to a second end, such that a sum of the cross sectional areas of the plurality of grooves is maintained substantially constant.

REFERENCES:
patent: Re25920 (1965-11-01), Moen
patent: 1319755 (1919-10-01), Cherry
patent: 2854027 (1958-09-01), Kaiser
patent: 2861769 (1958-11-01), Schumann
patent: 2934311 (1960-04-01), Sjoholm
patent: 3698683 (1972-10-01), De Angelis
patent: 3717177 (1973-02-01), Glesmann
patent: 4131128 (1978-12-01), Gotzenberger
patent: 4146055 (1979-03-01), Ryder
patent: 4475573 (1984-10-01), Hindman
patent: 4667927 (1987-05-01), Oscarsson
patent: 4802506 (1989-02-01), Aslanian
patent: 5186120 (1993-02-01), Ohnishi
patent: 5370154 (1994-12-01), Greer

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Flow control valve for use in fabrication of semiconductor devic does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flow control valve for use in fabrication of semiconductor devic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow control valve for use in fabrication of semiconductor devic will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-338719

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.