Substrate positioning system

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

Reexamination Certificate

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Details

C250S492210

Reexamination Certificate

active

06921907

ABSTRACT:
A substrate positioning system is provided to facilitate the performing of certain processing on the substrate, such as ion implantation. The system comprises a linkage rotatably mounted to a base and an end effector member rotatably mounted to the linkage and configured for receiving a substrate. Through the synchronized rotation of the linkage about the base and the end effector member about the linkage, the system acts as a robotic unit to move the substrate to the desired location for performing processing thereon. In another aspect, the base is movable along an axis such that the system maintains a constant distance of travel for an ion beam incident on the substrate as the linkage and end effector member travel in a curved path.

REFERENCES:
patent: 5895923 (1999-04-01), Blake
patent: 6777687 (2004-08-01), Vanderpot et al.

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