Resist composition

Details Resist composition Resist composition

2005-07-12

2005-07-12

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000

Reexamination Certificate

active

06916593

ABSTRACT:
Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed.

REFERENCES:
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patent: 5442087 (1995-08-01), Eichhorn et al.
patent: 5529886 (1996-06-01), Eichhorn et al.
patent: 5612169 (1997-03-01), Eichhorn et al.
patent: 5741621 (1998-04-01), Kempt et al.
patent: 5968712 (1999-10-01), Thackeray et al.
patent: 6274286 (2001-08-01), Hatakeyama et al.

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