Defect inspection apparatus for phase shift mask

Details Defect inspection apparatus for phase shift mask Defect inspection apparatus for phase shift mask

2005-04-12

2005-04-12

Stafira, Michael P. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237400

Reexamination Certificate

active

06879393

ABSTRACT:
The present invention relates to a defect inspection apparatus for a phase shift mask that is capable of detecting phase shifter defects that cannot be detected by conventional inspection techniques, by a simple method using an optical method and a comparison of electric signals. In a defect inspection apparatus for a phase shift mask having a phase shifter pattern provided on a mask transparent substrate1, after the phase shifter pattern has been formed, a phase shifter defect inspection is performed from the mask transparent substrate1side of the phase shift mask1. To perform the defect inspection, light12is applied to the phase shift mask1from the mask transparent substrate1side thereof, and reflection images of at least two different phase shifter pattern fabricated regions are captured by photoelectric conversion light-receiving elements15aand15b. The respective image signals17and18of the reflection images are compared with each other to detect a defect on the mask from the difference between the signals.

REFERENCES:
patent: 5220403 (1993-06-01), Batchelder et al.
patent: 5764363 (1998-06-01), Ooki et al.
patent: 6018392 (2000-01-01), Tzu et al.
patent: 6064477 (2000-05-01), Matsumoto et al.
patent: 6078386 (2000-06-01), Tsai et al.

Affiliated with

Also associated with

Rating

Defect inspection apparatus for phase shift mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Defect inspection apparatus for phase shift mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Defect inspection apparatus for phase shift mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3376457