Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-04-12
2005-04-12
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S907000, C430S914000
Reexamination Certificate
active
06878502
ABSTRACT:
A positive resist composition comprises (A) a resin which comprises a specified repeating units and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation.
REFERENCES:
patent: 6610456 (2003-08-01), Allen et al.
patent: 6753132 (2004-06-01), Kishimura et al.
patent: 20020061464 (2002-05-01), Acai et al.
patent: 20020155376 (2002-10-01), Hashimoto et al.
patent: 20020160297 (2002-10-01), Fedynyshyn et al.
patent: 20030108811 (2003-06-01), Mizutani et al.
patent: 42 07 261 (1993-09-01), None
patent: 42 07 264 (1993-09-01), None
patent: 2002-2396781 (2002-10-01), None
patent: WO 0017712 (2000-03-01), None
patent: WO 02069043 (2002-09-01), None
Hiroshi Ito, et al. “Polymer design for 157 nm chemically amplified resists.” Proceedings of SPIE vol. 4345, 2001, pp. 273-284.
H. Ito, et al. “Novel Fluoropolymers for Use in 157 nm Lithography.” Journal of Photopolymer Science and Technology. vol. 14, No. 4,, 2001, pp. 583-593.
Fender P.J. Brock et al., “Characterization of New Aromatic Polymers for 157 nm Photoresist Applications”, SPIE vol. 4345 (2001), pp. 417-427.
Theodore H. Fedynyshyn et al., “High Resolution Fluorocarbon Based Resist for 157-nm Lithography”, SPIE vol. 4345 (2001), pp. 296-307.
Roderick R. Kunz et al., “Experimental VUV Absorbance Study of Fluorine-Functionalized Polystyrenes”, SPIE vol. 4345 (2001), pp. 285-295.
XP-002251501—Derwent Publication—abstract (2002).
European Search Report dated Sep. 8, 2003.
Kanna Shinichi
Mizutani Kazuyoshi
Fuji Photo Film Co. , Ltd.
Schilling Richard L.
Sughrue & Mion, PLLC
LandOfFree
Positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3376380