Light sensitive composition and light sensitive planographic...

Details Light sensitive composition and light sensitive planographic... Light sensitive composition and light sensitive planographic...

2005-05-10

2005-05-10

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S302000

Reexamination Certificate

active

06890702

ABSTRACT:
Disclosed are a light sensitive composition containing A) an addition polymerizable ethylenically double bond-containing monomer, B) a photopolymerization initiator, and C) a polymer binder, wherein the addition polymerizable ethylenically double bond-containing monomer is a reaction product of a tertiary amine having two or more hydroxyl groups in the molecule, a diisocyanate having an aromatic ring in the molecule and a compound having a hydroxyl group and an addition polymerizable ethylenically double bond in the molecule, and a light sensitive planographic printing plate precursor comprising the light sensitive composition.

REFERENCES:
patent: 6475700 (2002-11-01), Higashi et al.
patent: 20040091816 (2004-05-01), Matsumura et al.
patent: 0 184 725 (1986-06-01), None
patent: 602 292 (1994-06-01), None
patent: 0 624 825 (1994-11-01), None
patent: 1 096 314 (2001-05-01), None
Chemical Abstracts, vol. 102, No. 4, Jan. 28, 1985, Columbus, Ohio, US; abstract No. 36783, “Photosensitive composition” XP002257099 of JP 59 111638 A, (Toyo Rubber Industry Co., Ltd.) Apr. 27, 1984.
Database WPI, Section Ch, Week 200257, Derwent Publications Ltd., London, GB; AN 2002-531980, XP002257100 of JP 2002 128857 A (Nippon Kayaku KK), May 9, 2002.
Patent Abstracts of Japan, vol. 018, No. 362 (P-1766) Jul. 7, 1994 of JP 06 095383 A (Konica Corp), Apr. 8, 1994.

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