Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

2005-01-25

2005-01-25

Van, Quang T. (Department: 3742)

Electric heating

Metal heating

By arc

C219S121400, C118S7230IR, C204S298380

Reexamination Certificate

active

06847003

ABSTRACT:
A plasma processing apparatus includes a processing container53, a mounting table61arranged in the processing container53to support a wafer W, a sealing plate55opposed to the wafer W supported by the mounting table61, an annular antenna73arranged on the sealing plate55and consisting of an annular waveguide to introduce a microwave into the processing container53through the sealing plate55, the annular antenna73being arranged so that a plane containing an annular waveguide path defined by the annular waveguide is generally parallel with the sealing plate55, a directional coupler79arranged on the periphery of the annular antenna73, a propagation waveguide81connected to the directional coupler79and a microwave oscillator83connected to the propagation waveguide81. Accordingly, it is possible to form an uniform microwave in the antenna, so that an uniform plasma can be produced in the processing container.

REFERENCES:
patent: 6358361 (2002-03-01), Matsumoto
patent: 6388632 (2002-05-01), Murakawa et al.
patent: 6497783 (2002-12-01), Suzuki et al.
patent: 05345982 (1993-12-01), None
patent: 11040397 (1999-02-01), None
patent: 11121196 (1999-04-01), None

Affiliated with

Also associated with

Rating

Plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3368801