Method for forming micropatterns

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C005S008000, C005S306000, C005S306000, C369S100000, C369S277000

Reexamination Certificate

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06872511

ABSTRACT:
A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.

REFERENCES:
patent: 4729940 (1988-03-01), Nee et al.
patent: 4797316 (1989-01-01), Hecq et al.
patent: 3-63947 (1991-03-01), None

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