Positive image-forming material

Details Positive image-forming material Positive image-forming material

2002-01-14

2004-04-06

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000

Reexamination Certificate

active

06716565

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to a positive image-forming material applicable to image-forming materials such as three-dimensional modeling by light, holography, lithographic printing plates, color proofs, photoresists and color filters, and inks, paints and adhesives. In particular, the invention relates to a positive image-forming material favorably usable as the so-called direct lithographic printing plate material capable of plate-making directly from digital signals in a computer with various kinds of lasers, or suitably usable as photoresist materials.
BACKGROUND OF THE INVENTION
These years, it has become easy to acquire a compact and high power model of a solid laser, a semiconductor laser and a gas laser irradiating ultraviolet light, visible light or infrared light ranged from 300 nm to 1200 nm. These lasers are very useful as a recording light source when a printing plate is directly made by using digital data in a computer or the like.
Many studies have been done on recording materials responsive to these various kinds of laser beams. Typical ones are as follows:
First, for materials which can be recorded by an infrared laser irradiating 760 nm or more in photosensitive wavelength, positive recording materials described in U.S. Pat. No. 4,708,925 are mentioned.
Secondly, for recording materials responsive to ultraviolet light or visible light ranged from 300 nm to 700 nm, there are many materials such as radical polymerization-based negative recording materials described in U.S. Pat. No. 2,850,445 and Japanese Patent Publication No. 20189/1969.
On the other hand, materials responsive to short wavelength light of 300 nm or less and electron beams are particularly important for photoresist materials. In recent years, integrated circuits have endlessly been improved to a higher scale of integration. In manufacture of semiconductor boards with ULSIs (ultra-large scale integrated circuits), processing with ultra-fine pattern of 0.5 micrometer or less in line width is needed. In order to meet such a need, the wavelength of light in an exposure apparatus used for photolithography has become shorter to utilize far ultraviolet light or excimer laser light (XeCl, KrF or ArF), and further, formation of ultra-fine patterns by means of electron beams has come under investigation. In particular, electron beams are regarded as a promising light source for pattern formation techniques in the next generation.
The problem in common with all these image-forming materials is to obtain compatibility between film strength of the photosensitive layer and storage stability.
From viewpoint of printing durability, recording materials for lithographic printing plate materials need strong film strength. However, it is a difficult problem to obtain compatibility between film strength and storage stability of the photosensitive layer. With conventional arts, results to be sufficiently satisfied have not been obtained yet. Innovative techniques have, therefore, been desired.
On the other hand, recording materials for photoresist materials need strong film strength from viewpoint of etching resistance. Also in this case, it is a difficult problem to obtain compatibility between film strength and storage stability of the photosensitive layer. With prior arts, results to be sufficiently satisfied have not been obtained yet. Innovative techniques have, therefore, been desired.
SUMMARY OF THE INVENTION
The object of the present invention is, particularly regarding positive image-forming materials in the field of image-forming technology, to provide a positive image-forming material having advantages in film strength of the photosensitive layer and storage stability.
In particular, the object of the invention is to provide a positive image-forming material suitable to a lithographic printing plate material capable of plate-making directly by recording digital data in a computer with a solid laser or a semiconductor laser irradiating ultraviolet light, visible light or infrared light as well as to result in being excellent in film strength of the photosensitive layer and storage stability.
In the results of diligent investigations by the inventors of the invention, it has been found that the above objects can be achieved by using a polymer obtained by polymerizing specific monomer in a positive image-forming material. The invention has the following constitution.
(1) A positive image-forming material comprising a resin including a repeating unit corresponding to a monomer having a structure represented by formula (I):
wherein Q
1
represents a cyano group (CN) or a group represented by —COX
2
; X
1
and X
2
each independently represents a hetero atom or a halogen atom; R
a
and R
b
each independently represents a hydrogen atom, a halogen atom, a cyano group or an organic residual group; and each of X
1
and X
2
, R
a
and R
b
, X
1
and R
a
, and X
1
and R
b
may combine each other to form a cyclic structure.
(2) The positive image-forming material as described in item (1), wherein the resin contains an aliphatic cyclic structure in at least one of the main chain and the side chain.
(3) The positive image-forming material as described in item (1), wherein the resin further contains a repeating unit corresponding to a monomer having an aliphatic cyclic structure.
(4) The positive image-forming material as described in item (1), wherein the resin contains the repeating unit corresponding to a monomer having a structure represented by formula (I) in an amount of 5 mol % or more based on the entire repeating units.
(5) The positive image-forming material as described in item (2), wherein the resin contains a repeating unit having an aliphatic cyclic structure in an amount of 10 mol % or more based on the entire repeating units.
(6) The positive image-forming material as described in item (1), wherein the resin contains an alkali-soluble group.
(7) The positive image-forming material as described in item (1), which comprises the resin in an amount of 5 wt % to 100 wt % based on the amount of entire resins in the positive image-forming material.
(8) The positive image-forming material as described in item (1), which further comprises a photosensitive agent.
(9) The positive image-forming material as described in item (1), which further comprises a water-insoluble and alkali-soluble resin.
(10) The positive image-forming material as described in item (1), wherein X
1
and X
2
in formula (I) each independently represents a halogen atom or a non-metallic atom.
(11) The positive image-forming material as described in item (10), wherein the non-metallic atom is an oxygen atom, a sulfur atom, a nitrogen atom or a phosphor atom.
(12) The positive image-forming material as described in item (10), wherein the non-metallic atom has a substituent.
(13) The positive image-forming material as described in item (1), wherein X
1
represents a halogen atom, a hydroxyl group, a substituted oxy group, a mercapto group, a substituted thio group, an amino group, a substituted amino group, a sulfo group, a sulfonato group, a substituted sulfinyl group, a substituted sulfonyl group, a phosphono group, a substituted phosphono group, a phosphonato group, a substituted phosphonato group, a nitro group or a heterocyclic group.
(14) The positive image-forming material as described in item (1), wherein X
2
represents a halogen atom, a hydroxyl group, a substituted oxy group, a mercapto group, a substituted thio group, an amino group, a substituted amino group or a heterocyclic group.
(15) A lithographic printing plate precursor comprising an image-forming layer containing the positive image-forming material as described in the item (1).
(16) An acid-decomposable photosensitive composition comprising: a photo-acid generator; and a resin including a repeating unit corresponding to a monomer having a structure represented by formula (I):
wherein Q
1
represents a cyano group (CN) or a group represented by —COX
2
; X
1
and X
2
each independently represents a hetero atom or a halogen atom; R
a
and R
b
each

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