Designing method of semiconductor integrated circuit using...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

06643840

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a designing method of a semiconductor integrated circuit. Particularly, the present invention relates to a designing method of a semiconductor integrated circuit using a library storing a mask pattern of a macro circuit.
2. Description of the Related Art
When a layout of a semiconductor integrated circuit is designed, a macro circuit is used which is a circuit block having a certain function. The usage of the macro circuit facilitates design of the layout.
A layout method for a semiconductor integrated circuit using a macro circuit is disclosed in Japanese Laid Open Patent Application (JP-A-Heisei 1-293534) and corresponding Japanese Patent No. 2575180. In the known layout method, mega-cells
101
,
102
and
103
constituted by combinations of a plurality of standard cells are arranged as shown in
FIG. 1. A
macro circuit
101
has terminals Pa
1
to Pa
3
, terminals Pb
1
to Pb
3
and terminals Pc
1
to Pc
3
. The terminals Pa
1
to Pa
3
, the terminals Pb
1
to Pb
3
and the terminals Pc
1
to Pc
3
are located in a plurality of sides on a rectangular area defining the macro circuit
101
. Wirings connected to the macro circuit
101
are connected to the terminals Pa
1
to Pa
3
, the terminals Pb
1
to Pb
3
and the terminals Pc
1
to Pc
3
. The known layout method protects the mounted wiring from bypassing the macro circuit
101
.
However, an output buffer for outputting a signal from the macro circuit is not noted in the above-mentioned Japanese Laid Open Patent Application (JP-A-Heisei 1-293534) and corresponding Japanese Patent No. 2575180.
Another layout method for a semiconductor integrated circuit is disclosed in Japanese Laid Open Patent Application (JP-A-Heisei, 4-78153). In this known layout method, a logical cell array
202
, memories
204
,
205
and input/output buffer cell
206
s
are mounted in a semiconductor integrated circuit
201
, as shown in
FIG. 2. A
large number of logical cells
203
, which are small-scale macro cells, are mounted in the logical cell array
202
. The memories
204
,
205
are large-scale macro cells. The input/output buffer cells
206
are small-scale macro cells. In this known semiconductor integrated circuit, the wiring between the small-scale macro cells is laid so as to bypass the memories
204
,
205
.
At first, terminal extension areas
211
,
212
and
213
are defined around the memories
204
and
205
, as shown in FIG.
3
. Terminals of the logical cells
203
and the input/output buffer cells
206
, are extensively laid in the terminal extension areas
211
,
212
and
213
. Extensive positions
211
a
,
212
a
and
213
a
of the terminal are defined as tip ends of the terminal extension areas
211
,
212
and
213
.
Moreover, extensive routes
211
b
,
212
b
and
213
b
are defined from the terminal of the input/output buffer cell
206
to the respective extensive positions
211
a
,
212
a
and
213
a
, as shown in FIG.
4
.
Moreover, as shown in
FIG. 2
, a terminal B of the input/output buffer cell
206
is extended up to the respective extensive positions
211
a
,
212
a
and
213
a
along the extensive routes
211
b
,
212
b
and
213
b
. The extended terminal B is referred to as an extensive terminal B
1
hereinafter. The extensive terminal B
1
is connected to a terminal A of the logical cell
203
.
This known layout method can shorten a time required to find out a wiring route of a wiring for connecting the logical cell
203
and the input/output buffer cell
206
.
Also, still another layout method for a semiconductor integrated circuit is disclosed in Japanese Laid Open Patent Application (JP-A-Heisei, 11-260923). In this known layout method for the semiconductor integrated circuit, a spare cell is mounted in addition to usage cells. When the design of the circuit is changed, the spare cell is used to easily change the circuit. This known layout method relates to the layout method for the spare cell.
A spare cell having a structure shown in
FIG. 5
is firstly placed in designing a semiconductor integrated circuit. The spare cell is provided with a P-type MOS transistor
301
and an N-type MOS transistor
302
. A source
301
a
of the P-type MOS transistor
301
and a source
302
a
of the N-type MOS transistor
302
are respectively connected through wirings
307
,
306
to a ground line
316
. Both the sources
301
a
,
302
a
are electrically separated from a power supply line
315
.
When a circuit included in the semiconductor integrated circuit is changed, the spare cell is used. When the spare cell is used, its structure is changed as shown in FIG.
6
. The source
301
a
of the P-type MOS transistor
301
is separated from the ground line
316
and connected through a wiring
310
to the power supply line
315
. Thus, the spare cell serves as an inverter. The usage of the spare changes the circuit included in the semiconductor integrated circuit.
When the spare cell placed in this known layout method is at a non-usage state, there is no route through which a current flows from the power supply cell
315
to the ground line
316
. Thus, it is possible to reduce a consumptive current in the semiconductor integrated circuit designed on the basis of this known layout method.
Also, a semiconductor integrated circuit in which a consumptive current is reduced is disclosed in Japanese Laid Open Patent Application (JP-A-Showa, 62-23131). In this known semiconductor integrated circuit, a usage unit cell
404
and a non-usage unit cell
404
A are mounted as shown in FIG.
7
. In the usage unit cell
404
, MISFETs Qp′, Qn′ are connected through a wiring
416
′ to each other. The MISFETs Qp′, Qn′ constitute an inverter. An output signal of the inverter is outputted from the wiring
416
′. On the other hand, the non-usage unit cell
404
A contains MISFETs Qp, Qn. A wiring
416
is cut away, and drain areas
410
,
411
of the MISFETs Qp, Qn are electrically separated from each other. Thus, it is possible to reduce a consumptive current in the semiconductor integrated circuit.
However, an arrangement of a macro circuit is not noted in Japanese Laid Open Patent Application (JP-A-Heisei, 11-260923 and JP-A-Showa 62-23131).
SUMMARY OF THE INVENTION
An object of the present invention is to provide a wiring method for a semiconductor integrated circuit, in which a wiring included in the semiconductor integrated circuit can be designed so as not to bypass a macro circuit, an apparatus for wiring a semiconductor integrated circuit, and a macro library.
Another object of the present invention is to provide a wiring method for a semiconductor integrated circuit, which can reduce a consumptive power of a designed semiconductor integrated circuit, an apparatus for wiring a semiconductor integrated circuit, and a macro library.
Still another object of the present invention is to provide a wiring method for a semiconductor integrated circuit, in which a wiring included in the semiconductor integrated circuit can be designed so as not to bypass a macro circuit, and further a consumptive power of the designed semiconductor integrated circuit is reduced, an apparatus for wiring a semiconductor integrated circuit, and a macro library.
In order to achieve an aspect of the present invention, a designing method of a semiconductor integrated circuit is composed of providing a library storing a macro mask pattern for a macro circuit including buffer circuits, selecting one of the buffer circuits as a selected buffer circuit and arranging the macro mask pattern and a third wiring pattern to produce an integrated circuit mask. Each of buffer circuits is composed of first and second wirings apart from each other, and first and second semiconductor elements. The first semiconductor element selectively supplies the first wiring with a power supply potential in accordance with the output signal. The second semiconductor element selectively supplies the second wiring with a grounded potential in accordance with the output si

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