Photosensitive polymer composition and negative working photosen

Details Photosensitive polymer composition and negative working photosen Photosensitive polymer composition and negative working photosen

1996-12-19

1998-10-13

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302851, 4302781, 430910, 522 63, 522107, 522109, G03F 7033, G03F 7038

Patent

active

058210326

ABSTRACT:
A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester, a photocrosslinkable copolymer of styrene and maleic anhydride, and a photoinitiator. The photocrosslinkable resins are present at a total weight ratio to the polymerizable monomer of at least 1.5:1.

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