Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent
1994-12-08
1997-09-02
Wilczewski, Mary
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
438586, 438637, H01L 21443, H01L 23552, H01L 310224
Patent
active
056630948
ABSTRACT:
A semiconductor device having i) a common opening 110 reaching a conductive region 105 through at least one conductive layer 107 and ii) another conductive layer 109 deposited in the opening 101, the conductive layer 107 and the conductive region 105 being electrically connected in the common opening 110. Also disclosed is a process comprising previously forming a plurality of conductive regions 105 and 107, thereafter forming an opening 110 that opens at the conductive regions, and depositing another conductive region 109 in the opening 110 to electrically connect the respective conductive regions in the opening. This can achieve a wiring connection structure that enables prevention of an increase in the number of masks used to form openings for wiring connection, an increase in the number of steps and an increase in the area held by openings, to thereby enhance the degree of integration of semiconductor devices.
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Canon Kabushiki Kaisha
Wilczewski Mary
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