Method for patterning metal oxide thin film

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156643, 156656, 156667, 252 792, 252 793, 252 794, B44C 122, C23F 100

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active

052717976

ABSTRACT:
A method for patterning a metal oxide thin film comprising the steps of: (1) preparing a mixture solution containing alkoxide or alkoxyalcoholate and alcohol or alkoxyalcohol, (2) mixing an acid-generating agent with the mixture solution, (3) applying the mixture solution to a substrate to form a thin film and drying the thin film, (4) selectively irradiating the thin film formed on the substrate to accelerate the gelation, (5) removing the non-irradiated thin film, and (6) burning the remaining thin film. According to the present invention, a metal oxide thin film is formed by sol-gel method, and thereto is mixed an acid-generating agent, so that etching by irradiating can be applied to a precursor thin film not sintered. Thanks to this, a metal oxide thin film can be easily patterned with a fine processing.

REFERENCES:
patent: 4838989 (1989-06-01), Ashby et al.
patent: 4874462 (1989-10-01), Makita et al.

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