Photosensitive elastomeric composition

Details Photosensitive elastomeric composition Photosensitive elastomeric composition

1979-09-28

1981-05-05

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415918, 20415923, 204281, 204286, 430913, 430919, G03C 168

Patent

active

042660050

ABSTRACT:
A novel photosensitive elastomeric composition comprising a thermoplastic elastomer, an ethylenically unsaturated compound, a photopolymerization initiator and an N-substituted maleimide compound. The composition of the present invention is excellent in photosensitivity. The composition of the present invention is useful especially for the manufacture of flexographic printing elements.

REFERENCES:
patent: 3551160 (1970-12-01), Bakos et al.
patent: 3622321 (1971-11-01), Saaets et al.
patent: 3627529 (1971-12-01), Frank et al.
patent: 4023973 (1977-05-01), Imaizumi et al.
patent: 4045231 (1977-08-01), Toda et al.
patent: 4162919 (1979-07-01), Richter

Affiliated with

Also associated with

Rating

Photosensitive elastomeric composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive elastomeric composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive elastomeric composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-296503