Method for removing particulate contaminants by magnetic field s

Details Method for removing particulate contaminants by magnetic field s Method for removing particulate contaminants by magnetic field s

1993-10-29

1995-06-27

Wyszomierski, George

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 437946, 216 67, B08B 600

Patent

active

054276217

ABSTRACT:
A novel and improved method of in-situ cleaning unwanted films and particles of a material from a surface situated inside a vacuum chamber by equipping such chamber with a means of generating a magnetic field having a magnetic flux density of at least 25 gauss, flowing at least one gas into the chamber and igniting a plasma and thus producing plasma ions of at least one gas, switching on the magnetic field generating means to a magnetic flux density of no less than 25 gauss and, reducing the magnetic field by a flux density of at least 10 gauss such that the unwanted films and particles of the material are dislodged from the surface by the sudden change in the magnetic flux density at the magnetic field.

REFERENCES:
patent: 4874494 (1989-10-01), Ohmi
patent: 5114529 (1992-05-01), Masuyama

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