Method of making nitride-based compound semiconductor...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step

Reexamination Certificate

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C257SE21267

Reexamination Certificate

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07348278

ABSTRACT:
A method of making a nitride-based compound semiconductor crystal has the step of growing a nitride-based compound semiconductor crystal with a predetermined thickness by using a nitride-based compound semiconductor substrate as a seed crystal. The nitride-based compound semiconductor substrate as the seed crystal is polished at both surfaces thereof.

REFERENCES:
patent: 6770135 (2004-08-01), Schowalter et al.
patent: 7009215 (2006-03-01), D'Evelyn et al.
patent: 2002/0197825 (2002-12-01), Usui et al.
patent: 2003/0017685 (2003-01-01), Usui et al.
patent: 2002-343728 (2002-11-01), None
patent: 2003-178984 (2003-06-01), None

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