Multilayer imageable element with improved chemical resistance

Details Multilayer imageable element with improved chemical resistance Multilayer imageable element with improved chemical resistance

2008-03-04

2008-03-04

Schilling, Richard L. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S302000, C430S326000, C430S330000, C430S905000, C430S910000, C430S964000

Reexamination Certificate

active

07338745

ABSTRACT:
Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone and attached groups represented by the following Structure Q:wherein L1, L2, and L3independently represent linking groups, T1, T2, and T3independently represent terminal groups, and a, b, and c are independently 0 or 1. The imageable elements have improved resistance to development and printing chemicals and solvents.

REFERENCES:
patent: 6352811 (2002-03-01), Patel et al.
patent: 6358669 (2002-03-01), Savariar-Hauck et al.
patent: 6969579 (2005-11-01), Kitson et al.
patent: 7247418 (2007-07-01), Saraiya et al.
patent: 2004/0234892 (2004-11-01), Ray et al.
patent: 2005/0037280 (2005-02-01), Loccufier et al.
patent: 1 522 417 (2005-04-01), None
patent: 2005/100419 (2005-10-01), None
U.S. Appl. No. 11/204,783 titled “Multilayer Imageable Element With Modified Phenolic Resin” by, K.B. Ray et al, filed Aug. 16, 2005.

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