Semiconductor device manufacturing: process – Making passive device
Reexamination Certificate
2008-05-27
2008-05-27
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Making passive device
C438S238000, C438S513000, C438S680000, C257SE21008, C257S017000, C257S041000, C257S277000, C257S645000, C257SE51008, C257S004000, C257S038000, C257SE23007, C257S074000, C257S165000
Reexamination Certificate
active
07378328
ABSTRACT:
A fast, reliable, highly integrated memory device formed of a carbon nanotube memory device and a method for forming the same, in which the carbon nanotube memory device includes a substrate, a source electrode, a drain electrode, a carbon nanotube having high electrical and thermal conductivity, a memory cell having excellent charge storage capability, and a gate electrode. The source electrode and drain electrode are arranged with a predetermined interval between them on the substrate and are subjected to a voltage. The carbon nanotube connects the source electrode to the drain electrode and serves as a channel for charge movement. The memory cell is located over the carbon nanotube and stores charges from the carbon nanotube. The gate electrode is formed in contact with the upper surface of the memory cell and controls the amount of charge flowing from the carbon nanotube into the memory cell.
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Choi Won-bong
Chu Jae-uk
Yoo In-kyeong
Lee & Morse P.C.
Nhu David
Samsung Electronics Co,. Ltd.
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