Polymer, resist protective coating material, and patterning...

Details Polymer, resist protective coating material, and patterning... Polymer, resist protective coating material, and patterning...

2008-04-08

2008-04-08

Walke, Amanda (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C526S072000, C526S319000, C526S321000, C526S320000

Reexamination Certificate

active

07354693

ABSTRACT:
In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.

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