Photosensitive composition, compound for use in the...

Details Photosensitive composition, compound for use in the... Photosensitive composition, compound for use in the...

2008-03-11

2008-03-11

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S910000, C430S921000, C558S056000, C562S083000

Reexamination Certificate

active

07341817

ABSTRACT:
A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a pattern forming method using a photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation.

REFERENCES:
patent: 5344742 (1994-09-01), Sinta et al.
patent: 5670691 (1997-09-01), Spangler et al.
patent: 5965319 (1999-10-01), Kobayashi
patent: 6440634 (2002-08-01), Ohsawa et al.
patent: 6492091 (2002-12-01), Kodama et al.
patent: 6933094 (2005-08-01), Miyaji et al.
patent: 2003/0068573 (2003-04-01), Takata et al.
patent: 2003/0203308 (2003-10-01), Mizutani et al.
patent: 2003/0215738 (2003-11-01), Ohsawa et al.
patent: 0 708 368 (1996-04-01), None
patent: 0 708 368 (1996-04-01), None
patent: 1 243 968 (2002-09-01), None
patent: 1 376 232 (2004-01-01), None
patent: 1 376 232 (2004-01-01), None
patent: 1 457 819 (2004-09-01), None
patent: 1 457 819 (2004-09-01), None
patent: 1 462 858 (2004-09-01), None
patent: 1 462 858 (2004-09-01), None
patent: 2002-23353 (2002-01-01), None
patent: 2002-236359 (2002-08-01), None
patent: 2003-114523 (2003-04-01), None
patent: 2003-149812 (2003-05-01), None
patent: 2003-162059 (2003-06-01), None
patent: 2003-316004 (2003-11-01), None
Partial European Search Report dated Apr. 5, 2005.
Hiroshi Ito et al, “Influence of acid generator structure on T-top formation in high temperature bake process for environmental stabilization”. Proceedings of SPIE—The International Society for Optical Engineering, vol. 2438, 1995, pp. 53-60, XP-002437097.

Affiliated with

Also associated with

Rating

Photosensitive composition, compound for use in the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive composition, compound for use in the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive composition, compound for use in the... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2795317