Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2008-05-13
2008-05-13
Chu, John S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S192000, C430S193000, C430S314000, C430S318000, C430S326000, C430S330000
Reexamination Certificate
active
07371499
ABSTRACT:
A photoresist resin composition comprises about 10 to about 35% by weight of an acryl-based copolymer, about 5 to about 10% by weight of a quinone diazide compound, about 55 to about 80% by weight of a solvent, and about 0.01 to about 0.5% by weight of a silane-based surfactant where the weights of each of the acryl-based copolymer, quinone diazide compound, solvent, and silane-based surfactant are based on the total weight of acryl-based copolymer, quinone diazide compound, solvent, and silane-based surfactant. An overcoating layer formed using the photoresist resin composition has improved flatness, and thus defects on a display screen may be prevented and/or reduced.
REFERENCES:
patent: 4906458 (1990-03-01), Shigeta et al.
patent: 6841330 (2005-01-01), Miyake et al.
patent: 2004/0144753 (2004-07-01), Kang et al.
patent: 2005/0089790 (2005-04-01), Lee et al.
Na Yun-Jung
Noh Young-Tae
Park Eun-Joon
Cantor & Colburn LLP
Chu John S.
Samsung Electronics Co,. Ltd.
LandOfFree
Photoresist resin composition, method of forming a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoresist resin composition, method of forming a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoresist resin composition, method of forming a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2786459