Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

2008-05-20

2008-05-20

Cleveland, Michael (Department: 1792)

Coating apparatus

Gas or vapor deposition

C118S7230ER, C118S7230AN, C118S722000, C118S7230IR, C118S733000, C156S345290, C156S345480

Reexamination Certificate

active

07374620

ABSTRACT:
A substrate processing apparatus (10A) using a microwave plasma is disclosed wherein an inner partition wall (15) is provided within a process chamber (11) so that the inside of the process chamber (11) is divided into a space (11A) where a substrate to be processed is housed and a space (11B) which is defined by the inner partition wall (15) and the outer wall of the process chamber (11). By having such a structure, contamination of the substrate by a gas separated from the sealing material and contamination of the substrate caused by abnormal discharge can be prevented, thereby enabling clean processing of the substrate.

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