Protective layers compatible with thick film pastes

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S273100, C430S311000, C430S319000

Reexamination Certificate

active

07374859

ABSTRACT:
This invention relates to novel processes comprising a protective polymer layer in the fabrication of electronic devices using thick film pastes. The protective polymer layer is fabricated from materials which are insoluble after irradiation in the ester-type solvents contained in the thick film paste. By appropriate selection of protective film polymers, the protective film can be compatible with the thick film paste.

REFERENCES:
patent: 4373019 (1983-02-01), Watanabe et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
patent: 4985332 (1991-01-01), Anderson et al.
patent: 5164286 (1992-11-01), Blakeney et al.
patent: 5362927 (1994-11-01), Ezaki
patent: 5506090 (1996-04-01), Gardner et al.
patent: 5601638 (1997-02-01), Fukuda et al.
patent: 5756267 (1998-05-01), Matsuda et al.
patent: 5910392 (1999-06-01), Nozaki et al.
patent: 5942367 (1999-08-01), Watanabe et al.
patent: 6060207 (2000-05-01), Shida et al.
patent: 6060213 (2000-05-01), Kodama
patent: 6060841 (2000-05-01), Niiyama
patent: 6107360 (2000-08-01), Kaneko et al.
patent: 6238842 (2001-05-01), Sato et al.
patent: 6410748 (2002-06-01), Shida et al.
patent: 6534235 (2003-03-01), Hanobata et al.
patent: 6534671 (2003-03-01), Wu et al.
patent: 6558871 (2003-05-01), Takahashi et al.
patent: 6613499 (2003-09-01), Chang
patent: 6653043 (2003-11-01), Hanobata
patent: 6769945 (2004-08-01), Chang et al.
patent: 6798127 (2004-09-01), Mao et al.
patent: 6803423 (2004-10-01), Hayakawa
patent: 6811950 (2004-11-01), Kondo
patent: 7125648 (2006-10-01), Nagase
patent: 7186498 (2007-03-01), Gries
patent: 2002/0001720 (2002-01-01), Clough
patent: 2002/0058207 (2002-05-01), Urano et al.
patent: 2002/0074932 (2002-06-01), Bouchard et al.
patent: 2002/0094382 (2002-07-01), Imai
patent: 2002/0094483 (2002-07-01), Hattori et al.
patent: 2002/0106589 (2002-08-01), Rodney et al.
patent: 2003/0170559 (2003-09-01), Mizutani et al.
patent: 2004/0018453 (2004-01-01), Anzures et al.
patent: 2004/0137364 (2004-07-01), Kim
patent: 2004/0140861 (2004-07-01), Alvarez
patent: 2004/0170925 (2004-09-01), Roach et al.
patent: 2005/0058953 (2005-03-01), Chai et al.
patent: 2005/0112503 (2005-05-01), Kanda et al.
patent: 2005/0130082 (2005-06-01), Kanda
patent: 2005/0227168 (2005-10-01), Kim et al.
patent: 2005/0282094 (2005-12-01), Kim et al.
patent: 2006/0154158 (2006-07-01), Washio
patent: 0936 504 (1999-08-01), None
patent: 1184723 (2002-03-01), None
patent: 2000/108259 (2000-04-01), None
patent: 2000108259 (2000-04-01), None
patent: 2000/187327 (2000-07-01), None
patent: 2001-111217 (2001-04-01), None
patent: 2001/111217 (2001-04-01), None
patent: 2001/155626 (2001-06-01), None
patent: 2001-155626 (2001-08-01), None
patent: WO 2005/116761 (2005-12-01), None
English LAnguage Abstract of JP 2000-108259.
Wang, et al. Proceedings of the SPIE—The International Society for Optical Engineering (1999) vol. 3906, pp. 619-624.
International Search Report Dated Nov. 14, 2003.
Wun-Ku Wang et. al., Electrical Characterization of Polymer Thick Film Resistor, The International Society for Optical Engineering, 1999, vol. 3906:619-624.
J.V. Crivello, The Chemistry of Photoacid Generating Compounds in Polymeric Materials Science and Engineering, American Chemical Society Meeting, 1989, vol. 61:62-66.
T.A. Pressley, Method Development for Semivolatile Organics in Municipal Sludge, American Chemical Society Meeting, 1989, vol. 62-66.
Chen et. al., Solution Properties of Single-Walled Carbon Nanotubes, Science, 1998, vol. 282:95-98.
Zhaoxia et. al., Nonliner Optical Properties of Some Polymer/Multi-Walled Carbon Nanotube Composites, Chemical Physics Letters, 2000, vol. 318:505-510.
M. Dresselhaus et. al., Physics World-Physics Web, Carbon Nanotube, 1998, pp. 1-10.
S.L. Rosen, Polymers, The Kirk-Othmer Encyclopedia of Chemical Technology, Fourth Edition, John Wiley & Sons, pp. 881-904, vol. 19.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Protective layers compatible with thick film pastes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Protective layers compatible with thick film pastes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Protective layers compatible with thick film pastes will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2778748

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.