Dielectric stack containing lanthanum and hafnium

Details Dielectric stack containing lanthanum and hafnium Dielectric stack containing lanthanum and hafnium

2011-03-29

2011-03-29

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S720000, C438S721000, C257S296000, C257SE21646, C257SE21247

Reexamination Certificate

active

07915174

ABSTRACT:
Dielectric layers containing a dielectric layer including lanthanum and hafnium and methods of fabricating such dielectric layers provide an insulating layer in a variety of structures for use in a wide range of electronic devices.

REFERENCES:
patent: 3357961 (1967-12-01), Makowski et al.
patent: 3488633 (1970-01-01), King et al.
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4542870 (1985-09-01), Howell
patent: 4972516 (1990-11-01), Bryan et al.
patent: 5049516 (1991-09-01), Arima
patent: 5055319 (1991-10-01), Bunshah et al.
patent: 5057447 (1991-10-01), Paterson
patent: 5100825 (1992-03-01), Fazan et al.
patent: 5252370 (1993-10-01), Tominaga et al.
patent: 5334433 (1994-08-01), Tominaga
patent: 5364708 (1994-11-01), Tominaga
patent: 5401609 (1995-03-01), Haratani et al.
patent: 5406546 (1995-04-01), Uchiyama et al.
patent: 5418030 (1995-05-01), Tominaga et al.
patent: 5426603 (1995-06-01), Nakamura et al.
patent: 5430706 (1995-07-01), Utsunomiya et al.
patent: 5445699 (1995-08-01), Kamikawa et al.
patent: 5470628 (1995-11-01), Tominaga et al.
patent: 5496597 (1996-03-01), Soininen et al.
patent: 5498507 (1996-03-01), Handa et al.
patent: 5523140 (1996-06-01), Tominaga et al.
patent: 5552237 (1996-09-01), Utsunomiya et al.
patent: 5562952 (1996-10-01), Nakahigashi et al.
patent: 5569517 (1996-10-01), Tominaga et al.
patent: 5572052 (1996-11-01), Kashihara et al.
patent: 5577020 (1996-11-01), Utsunomiya et al.
patent: 5593789 (1997-01-01), Utsunomiya et al.
patent: 5620766 (1997-04-01), Uchiyama et al.
patent: 5627012 (1997-05-01), Tominaga et al.
patent: 5637371 (1997-06-01), Tominaga et al.
patent: 5637372 (1997-06-01), Tominaga et al.
patent: 5646583 (1997-07-01), Seabury et al.
patent: 5674563 (1997-10-01), Tarui et al.
patent: 5698022 (1997-12-01), Glassman et al.
patent: 5700567 (1997-12-01), Utsunomiya
patent: 5751021 (1998-05-01), Teraguchi
patent: 5792269 (1998-08-01), Deacon et al.
patent: 5801105 (1998-09-01), Yano et al.
patent: 5810923 (1998-09-01), Yano et al.
patent: 5825046 (1998-10-01), Czubatyj et al.
patent: 5827571 (1998-10-01), Lee et al.
patent: 5828080 (1998-10-01), Yano et al.
patent: 5840897 (1998-11-01), Kirlin et al.
patent: 5891542 (1999-04-01), Tominaga et al.
patent: 5906874 (1999-05-01), Takahashi et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5965323 (1999-10-01), Takahashi et al.
patent: 5981014 (1999-11-01), Tsukagoshi et al.
patent: 6002418 (1999-12-01), Yoneda et al.
patent: 6010969 (2000-01-01), Vaartstra
patent: 6019848 (2000-02-01), Frankel et al.
patent: 6020024 (2000-02-01), Maiti et al.
patent: 6020243 (2000-02-01), Wallace et al.
patent: 6025627 (2000-02-01), Forbes et al.
patent: 6027961 (2000-02-01), Maiti et al.
patent: 6030679 (2000-02-01), Saito et al.
patent: 6040030 (2000-03-01), Utsunomiya et al.
patent: 6051363 (2000-04-01), Utsunomiya et al.
patent: 6059885 (2000-05-01), Ohashi et al.
patent: 6061077 (2000-05-01), Kashiwaya et al.
patent: 6081287 (2000-06-01), Noshita et al.
patent: 6087067 (2000-07-01), Kato et al.
patent: 6087674 (2000-07-01), Ovshinsky et al.
patent: 6103330 (2000-08-01), Kosuda et al.
patent: 6110529 (2000-08-01), Gardiner et al.
patent: 6115401 (2000-09-01), Scobey et al.
patent: 6136168 (2000-10-01), Masujima et al.
patent: 6137520 (2000-10-01), Kashiwaya et al.
patent: 6153355 (2000-11-01), Takahashi et al.
patent: 6175377 (2001-01-01), Noshita et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6207589 (2001-03-01), Ma et al.
patent: 6211035 (2001-04-01), Moise et al.
patent: 6217645 (2001-04-01), Vaartstra
patent: 6225163 (2001-05-01), Bergemont
patent: 6225237 (2001-05-01), Vaartstra
patent: 6230651 (2001-05-01), Ni et al.
patent: 6242157 (2001-06-01), Tominaga et al.
patent: 6243941 (2001-06-01), Kashiwaya et al.
patent: 6256052 (2001-07-01), Yoneda
patent: 6256053 (2001-07-01), Noshita et al.
patent: 6273951 (2001-08-01), Vaartstra
patent: 6274937 (2001-08-01), Ahn et al.
patent: 6281042 (2001-08-01), Ahn et al.
patent: 6294420 (2001-09-01), Tsu et al.
patent: 6294813 (2001-09-01), Forbes et al.
patent: 6297103 (2001-10-01), Ahn et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6310376 (2001-10-01), Ueda et al.
patent: 6313035 (2001-11-01), Sandhu et al.
patent: 6316054 (2001-11-01), Kashiwaya et al.
patent: 6323081 (2001-11-01), Marsh
patent: 6323511 (2001-11-01), Marsh
patent: 6329036 (2001-12-01), Kikukawa et al.
patent: 6329286 (2001-12-01), Vaartstra
patent: 6331465 (2001-12-01), Forbes et al.
patent: 6337704 (2002-01-01), Yamaguchi
patent: 6342445 (2002-01-01), Marsh
patent: 6347749 (2002-02-01), Moore et al.
patent: 6350704 (2002-02-01), Ahn et al.
patent: 6351276 (2002-02-01), Yamaguchi
patent: 6358766 (2002-03-01), Kasahara
patent: 6365470 (2002-04-01), Maeda
patent: 6368398 (2002-04-01), Vaartstra
patent: 6380579 (2002-04-01), Nam et al.
patent: 6387712 (2002-05-01), Yano et al.
patent: 6395650 (2002-05-01), Callegari et al.
patent: 6403414 (2002-06-01), Marsh
patent: 6404027 (2002-06-01), Hong et al.
patent: 6406772 (2002-06-01), Tominaga et al.
patent: 6407435 (2002-06-01), Ma et al.
patent: 6410368 (2002-06-01), Kawasaki et al.
patent: 6420279 (2002-07-01), Ono et al.
patent: 6426245 (2002-07-01), Kawasaki et al.
patent: 6426292 (2002-07-01), Vaartstra
patent: 6441417 (2002-08-01), Zhang et al.
patent: 6444592 (2002-09-01), Ballantine et al.
patent: 6451641 (2002-09-01), Halliyal et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6452229 (2002-09-01), Krivokapic
patent: 6455330 (2002-09-01), Yao et al.
patent: 6455717 (2002-09-01), Vaartstra
patent: 6458701 (2002-10-01), Chae et al.
patent: 6461710 (2002-10-01), Kikukawa et al.
patent: 6465334 (2002-10-01), Buynoski et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6492659 (2002-12-01), Yamazaki et al.
patent: 6495436 (2002-12-01), Ahn et al.
patent: 6495437 (2002-12-01), Yu
patent: 6495449 (2002-12-01), Nguyen
patent: 6495458 (2002-12-01), Marsh
patent: 6509280 (2003-01-01), Choi
patent: 6514820 (2003-02-01), Ahn et al.
patent: 6514828 (2003-02-01), Ahn et al.
patent: 6528858 (2003-03-01), Yu et al.
patent: 6531354 (2003-03-01), Maria et al.
patent: 6534357 (2003-03-01), Basceri
patent: 6534420 (2003-03-01), Ahn et al.
patent: 6537613 (2003-03-01), Senzaki et al.
patent: 6537721 (2003-03-01), Inoue et al.
patent: 6541079 (2003-04-01), Bojarczuk, Jr. et al.
patent: 6542229 (2003-04-01), Kalal et al.
patent: 6544846 (2003-04-01), Ahn et al.
patent: 6551929 (2003-04-01), Kori et al.
patent: 6552383 (2003-04-01), Ahn et al.
patent: 6552388 (2003-04-01), Wilk et al.
patent: 6555875 (2003-04-01), Kawasaki et al.
patent: 6555879 (2003-04-01), Krivokapic et al.
patent: 6558563 (2003-05-01), Kashiwaya et al.
patent: 6562491 (2003-05-01), Jeon
patent: 6570248 (2003-05-01), Ahn et al.
patent: 6586792 (2003-07-01), Ahn et al.
patent: 6592942 (2003-07-01), Van Wijck
patent: 6596583 (2003-07-01), Agarwal et al.
patent: 6599788 (2003-07-01), Kawasaki et al.
patent: 6602720 (2003-08-01), Hsu et al.
patent: 6608378 (2003-08-01), Ahn et al.
patent: 6613656 (2003-09-01), Li
patent: 6617634 (2003-09-01), Marsh et al.
patent: 6617639 (2003-09-01), Wang et al.
patent: 6624013 (2003-09-01), Kawasaki et al.
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6638810 (2003-10-01), Bakli et al.
patent: 6638859 (2003-10-01), Sneh et al.
patent: 6642567 (2003-11-01), Marsh
patent: 6642573 (2003-11-01), Halliyal et al.
patent: 6645882 (2003-11-01), Halliyal et al.
patent: 6646307 (2003-11-01), Yu et al.
patent: 6652924 (2003-11-01), Sherman
patent: 6653657 (2003-11-01), Kawasaki et al.
patent: 6656764 (2003-12-01), Wang et al.
patent: 6660578 (2003-12-01), Karlsson et al.
patent: 6660631 (2003-12-01), Marsh
patent: 6660660 (2003-12-01), Haukka et al.
patent: 6661058 (2003-12-01), Ahn et al.
patent: 6664154 (2003-12-01), Bell et al.
patent: 6673701 (2004-01-01), Marsh et al.
patent: 6682602 (2004-01-01), Vaartstra
patent: 6686212 (2004-02-01), Conley, Jr. et al.
patent: 6688951 (2004-02-01), Kashiwaya et al.
patent: 6690055 (2004-02-01), Uhlenbrock

Affiliated with

Also associated with

Rating

Dielectric stack containing lanthanum and hafnium does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dielectric stack containing lanthanum and hafnium, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dielectric stack containing lanthanum and hafnium will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2777356