Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-05-27
2008-05-27
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07378198
ABSTRACT:
A mask pattern to be provided on a transparent substrate2includes a semi-light-shielding portion3which transmits exposure light in the same phase as that of the light-transmitting portion4and a phase shifter5which transmits exposure light in a phase opposite to that of the light-transmitting portion4. The semi-light-shielding portion3has a transmittance which allows exposure light to be partially transmitted. The phase shifter5is provided in a region of the mask pattern in which light transmitted through the phase shifter5can cancel part of the light transmitted through the light-transmitting portion4and the semi-light-transmitting portion3.
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Hua-Yu Liu et al., “The Application of Alternating Phase-shifting Masks to 140 nm Gate Patterning (II): Mask Design and Manufacturing Tolerances”, Optical Microlithography XI, SPIE-The International Society for Optical Engineering, vol. 3334, pp. 1-14, 25-27, Feb. 1998.
Japanese Office Action issued in corresponding Japanese Patent Application No. 2005-347649 dated Mar. 13, 2007.
Japanese Office Action issued in corresponding Japanese Patent Application No. 2005-348362 dated Mar. 13, 2007.
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
Rosasco Stephen
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