Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2008-05-20
2008-05-20
Kosowski, Alexander (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S110000, C438S009000
Reexamination Certificate
active
07376479
ABSTRACT:
A plasma processing method for processing a sample by using plasma on a lot unit basis, including: detecting plural kinds of information as monitor data relating to a processing state of the sample, using a plurality of sensors; selecting a detection time range of the monitor data thus detected; converting the monitor data within the selected detection time range into a converted signal; predicting a pattern shape of the sample based on the converted signal; calculating a correction quantity of a processing parameter, for decreasing a deviation between the predicted pattern shape and a standard value; and converting the correction quantity of a processing parameter obtained by the calculating operation when a kind of a next sample of a next lot is different from the sample, thereby to use a converted correction quantity of the processing parameter for a processing of the next sample.
REFERENCES:
patent: 5014217 (1991-05-01), Savage
patent: 5347460 (1994-09-01), Gifford et al.
patent: 5658423 (1997-08-01), Angell et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5910011 (1999-06-01), Cruse
patent: 6021215 (2000-02-01), Kornblit et al.
patent: 6153115 (2000-11-01), Le et al.
patent: 6192826 (2001-02-01), Smith et al.
patent: 6226086 (2001-05-01), Holbrook et al.
patent: 6240372 (2001-05-01), Gross et al.
patent: 6272233 (2001-08-01), Takeo
patent: 6275730 (2001-08-01), KenKnight et al.
patent: 6275740 (2001-08-01), Smith et al.
patent: 6438440 (2002-08-01), Hayashi
patent: 6442445 (2002-08-01), Bunkofske et al.
patent: 6590179 (2003-07-01), Tanaka et al.
patent: 6668207 (2003-12-01), Montcalm et al.
patent: 6747239 (2004-06-01), Tanaka et al.
patent: 6894786 (2005-05-01), Holbrook et al.
patent: 5-258705 (1993-10-01), None
patent: 7-56961 (1995-03-01), None
patent: 10-125660 (1998-05-01), None
patent: 11-087323 (1999-03-01), None
patent: 2000-200783 (2000-07-01), None
patent: 2000-349076 (2000-12-01), None
Ikuhara Shoji
Kitsunai Hiroyuki
Takahashi Kazue
Tanaka Junichi
Yamamoto Hideyuki
Antonelli, Terry Stout & Kraus, LLP.
Hitachi , Ltd.
Kosowski Alexander
LandOfFree
Process monitoring device for sample processing apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process monitoring device for sample processing apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process monitoring device for sample processing apparatus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2771891