Phase shift mask

Details Phase shift mask Phase shift mask

2008-04-22

2008-04-22

Rosasco, S. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07361434

ABSTRACT:
Semitransparent and trenchlike, absorber-free structure elements are formed jointly on a photomask formed using phase mask technology. The trenchlike structure elements are formed as trench or mesa structure using CPL technology. In a layout, dense, but also if appropriate semi-isolated and isolated, but relatively thin pattern portions are selected to fabricate them on the photomask using CPL technology. By contrast, isolated, wider pattern portions are formed as semitransparent structure elements using halftone phase mask technology. The respective process windows are relatively large and are adapted to one another. The joint process window is enlarged. In the area of dynamic memory chips, structures in a memory cell array can be formed using CPL technology and the support regions using halftone phase mask technology. In logic circuits, thin conductor tracks using CPL technology and wider conductor tracks using halftone phase mask technology can be fabricated.

REFERENCES:
patent: 5565286 (1996-10-01), Lin
patent: 6593039 (2003-07-01), Kim
patent: 6902852 (2005-06-01), Watanabe
patent: 2003/0064300 (2003-04-01), Watanabe
patent: 2004/0121244 (2004-06-01), Misaka

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