Self-aligned semiconductor contact structures

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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C257S382000, C257S314000

Reexamination Certificate

active

07397131

ABSTRACT:
A self-aligned contact structure and a method of forming the same include selected neighboring gate electrodes with adjacent sidewalls that are configured to angle toward each other. The angled surfaces of the gate electrodes can be protected using a liner layer that can extend the length of the contact window to define the sidewalls of the contact window.

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patent: 2002/0079492 (2002-06-01), Koga
patent: 2002/0195672 (2002-12-01), Lee et al.
patent: 2001-230383 (2001-08-01), None
patent: 2002222858 (2002-08-01), None
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Notification of First Office Action (2sheets) and text of the First Office Action (5sheets) from the Patent Office of the Republic of China for corresponding Chinese Application No. 200310104557.1, and an English language translation of the First Office Action (Notification, 3 sheets, text, 7 sheets).

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