Printing resist, method for preparing the same and...

Details Printing resist, method for preparing the same and... Printing resist, method for preparing the same and...

2011-08-23

2011-08-23

Kelly, Cynthia (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S322000, C430S326000, C430S281100

Reexamination Certificate

active

08003298

ABSTRACT:
Disclosed herein is a printing resist sequentially transferred to a printing plate and a substrate after being applied to a printing roll. The printing resist comprises at least one polymer main chain bound to a tackiness-inducing vinyl group. The surface of the printing resist has tackiness without complete dryness, thus enabling a correct transfer of the printing resist to the printing plate and substrate.

REFERENCES:
patent: 6177230 (2001-01-01), Kawamura
patent: 2004/0102548 (2004-05-01), Suzuki
patent: 2004/0197704 (2004-10-01), Elibeck
Debmalya Roy, P K Bass and S V Eswaran, Photoresist for Microlithography, Resonance, Aug. 2002, pp. 59-66.

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