Projection objective and projection exposure apparatus...

Details Projection objective and projection exposure apparatus... Projection objective and projection exposure apparatus...

2011-06-21

2011-06-21

Nguyen, Thong (Department: 2872)

Optical: systems and elements

Lens

With reflecting element

C359S364000, C359S366000

Reexamination Certificate

active

07965453

ABSTRACT:
A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |β|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n′<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmaxand are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y′. With COMP=Dmax/(Y′·(NA
′)2) the condition COMP<15.8 holds. Preferred embodiments have relatively small overall numbers of lenses which allows to fabricate the projection objectives relatively small in size with relatively low material consumption, yielding high performance, light weight, compact reduction projection objectives for dry lithography.

REFERENCES:
patent: 5515207 (1996-05-01), Foo
patent: 5636066 (1997-06-01), Takahashi
patent: 5652679 (1997-07-01), Freeman
patent: 5861997 (1999-01-01), Takahashi
patent: 6169627 (2001-01-01), Schuster
patent: 6426506 (2002-07-01), Hudyma
patent: 6600608 (2003-07-01), Shafer et al.
patent: 6717746 (2004-04-01), Epple et al.
patent: 6757051 (2004-06-01), Takahashi et al.
patent: 7030965 (2006-04-01), Takahashi
patent: 7079314 (2006-07-01), Suenaga et al.
patent: 7256932 (2007-08-01), Epple et al.
patent: 7301605 (2007-11-01), Omura et al.
patent: 7348575 (2008-03-01), Omura
patent: 7362508 (2008-04-01), Omura et al.
patent: 7738188 (2010-06-01), Ulrich et al.
patent: 2002/0024741 (2002-02-01), Terasawa et al.
patent: 2003/0011755 (2003-01-01), Omura et al.
patent: 2003/0011894 (2003-01-01), Schuster
patent: 2003/0197922 (2003-10-01), Hudyma
patent: 2003/0197946 (2003-10-01), Omura
patent: 2003/0234912 (2003-12-01), Omura
patent: 2003/0234992 (2003-12-01), Shafer
patent: 2004/0012866 (2004-01-01), Mann et al.
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0130806 (2004-07-01), Takahashi
patent: 2004/0160677 (2004-08-01), Epple et al.
patent: 2005/0117224 (2005-06-01), Shafer et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2007/0252094 (2007-11-01), Ulrich et al.
patent: 103 32 112 (2005-01-01), None
patent: 1 069 448 (2001-01-01), None
patent: 1 318 425 (2003-06-01), None
patent: 1 630 585 (2006-03-01), None
patent: 2002-208551 (2002-07-01), None
patent: 2002-372668 (2002-12-01), None
patent: 2003/114387 (2003-04-01), None
patent: 2004-317534 (2004-11-01), None
patent: 2005-003982 (2005-01-01), None
patent: WO 92/05462 (1992-04-01), None
patent: WO 94/06047 (1994-03-01), None
patent: WO 01/04682 (2001-01-01), None
patent: WO 01/51979 (2001-07-01), None
patent: WO 01/55767 (2001-08-01), None
patent: WO 01/59502 (2001-08-01), None
patent: WO 03/036361 (2003-05-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/107011 (2004-12-01), None
patent: WO 2005/040890 (2005-05-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/111689 (2005-11-01), None
M. H. Freeman, Innovative Wide-Field Binocular Design, OSA Proceedings of the International Optical Design Conference, 1994, pp. 389-393, vol. 22.
Tomoyuki Matsuyama et al., Nikon Projection Lens Update, Proceedings of SPIE, 2004, vol. 5377, No. 65.
Donald DeJager, Camera viewfinder using tilted concave mirror erecting elements, International Lens Design Conference (OSA), SPIE, 1980, pp. 292-298, vol. 237.
Tomoyuki Matsuyama, et al. “Microlithographic Lens for DUV Scanner”, SPIE vol. 4832, Dec. 2002, Conference Jun. 3-7, 2002, pp. 170-174.
Tomoyuki Matsuyama, et al, “High NA and Low Residual Aberration Projection Lens for DUV Scanner”, SPIE, vol. 4691, (2002) pp. 687-695.
Willi Ulrich et al, “Trends in Optical Design of Projection Lenses for UV- and EUV-Lithography”, Proc. of SPIE vol. 4146 (2000).
E. Glatzel, “New Lenses for Microlithography”, SPIE vol. 237 (1980), pp. 310-320.
Bruning, J.H., “Optical Lithography—Thirty Years and Three Orders of Magnitude”, SPIE, vol. 3049, pp. 14-27.

Affiliated with

Also associated with

Rating

Projection objective and projection exposure apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection objective and projection exposure apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection objective and projection exposure apparatus... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2743699