Methods of forming metal oxide and semimetal oxide

Details Methods of forming metal oxide and semimetal oxide Methods of forming metal oxide and semimetal oxide

Filed on

2008-04-29

Date issued

2008-04-29

Examiner

Hoang, Quoc (Department: 2818)

Patent Class

Semiconductor device manufacturing: process

SubClass

Coating of substrate containing semiconductor region or of...

SubSubClass

Insulative material deposited upon semiconductive substrate

Other Related Categories

C438S765000, C438S770000, C438S775000, C257SE21101

Type

Reexamination Certificate

Status

active

Patent number

07365028

Description

ABSTRACT:
The invention includes methods of forming metal oxide and/or semimetal oxide. The invention can include formation of at least one metal-and-halogen-containing material and/or at least one semimetal-and-halogen-containing material over a semiconductor substrate surface. The material can be subjected to aminolysis followed by oxidation to convert the material to metal oxide and/or semimetal oxide. The aminolysis and oxidation can be separate ALD steps relative to one another, or can be conducted in a reaction chamber in a common processing step.

REFERENCES:
patent: 5389401 (1995-02-01), Gordon
patent: 6960537 (2005-11-01), Shero et al.
patent: 2004/0043600 (2004-03-01), Vaartstra

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