Semiconductor storage device and method of manufacturing same

Details Semiconductor storage device and method of manufacturing same Semiconductor storage device and method of manufacturing same

2011-08-30

2011-08-30

Parker, Ken A (Department: 2815)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S314000, C257S315000, C257SE29129, C257SE29134, C257SE29136, C438S257000

Reexamination Certificate

active

08008705

ABSTRACT:
Disclosed is a semiconductor storage device having a trench around a bit-line diffusion region in an area of a p-well, which constitutes a memory cell area, that is not covered by a word line and a select gate that intersects the word line. An insulating film is buried in the trench.

REFERENCES:
patent: 5640345 (1997-06-01), Okuda et al.
patent: 6150281 (2000-11-01), Kwean
patent: 6512263 (2003-01-01), Yuan et al.
patent: 6653183 (2003-11-01), Hung et al.
patent: 6753226 (2004-06-01), Tsugane et al.
patent: 6809373 (2004-10-01), Nishizaka
patent: 6858491 (2005-02-01), Kokubun
patent: 7148104 (2006-12-01), Ding
patent: 2003/0103382 (2003-06-01), Kobayashi
patent: 2003/0235952 (2003-12-01), Shibata
patent: 2004/0099900 (2004-05-01), Iguchi et al.
patent: 2003-168748 (2003-06-01), None
patent: 2003-249575 (2003-09-01), None
patent: 2004-71646 (2004-03-01), None
patent: 2004-172488 (2004-06-01), None
patent: 2005-051227 (2005-02-01), None
Japanese Office Action dated Jun. 7, 2011 (with a partial English translation).

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