Flash memory with microcrystalline silicon carbide film floating

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide

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257314, 257321, H01L 2900

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active

058014012

ABSTRACT:
A memory is described which has memory cells that store data using hot electron injection. The data is erased through electron tunneling. The memory cells are described as floating gate transistors wherein the floating gate is fabricated using a conductive layer of microcrystalline silicon carbide particles. The microcrystalline silicon carbide particles are in contact such that a charge stored on the floating gate is shared between the particles. The floating gate has a reduced electron affinity to allow for data erase operations using lower voltages.

REFERENCES:
patent: 4507673 (1985-03-01), Aoyama et al.
patent: 5021999 (1991-06-01), Kohda et al.
patent: 5027171 (1991-06-01), Reedy et al.
patent: 5111430 (1992-05-01), Morie
patent: 5253196 (1993-10-01), Shimabukuro
patent: 5293560 (1994-03-01), Harari
patent: 5317535 (1994-05-01), Talreja et al.
patent: 5388069 (1995-02-01), Kokubo
patent: 5424993 (1995-06-01), Lee et al.
patent: 5430670 (1995-07-01), Rosenthal
patent: 5434815 (1995-07-01), Smarandoiu et al.
patent: 5438544 (1995-08-01), Makino
patent: 5449941 (1995-09-01), Yamazaki et al.
patent: 5467306 (1995-11-01), Kaya et al.
patent: 5477485 (1995-12-01), Bergemont et al.
patent: 5485422 (1996-01-01), Bauer et al.
patent: 5493140 (1996-02-01), Iguchi
patent: 5508543 (1996-04-01), Harstein et al.
patent: 5627781 (1997-05-01), Hayashi et al.
patent: 5670790 (1997-09-01), Katoh et al.
Alom, D. et al., "Electrical Properties of Thermal Oxide Grown on N-type 6H-Silicon Carbide", Appln. Phys. Lett., vol. 64, 2845-2846, (1994).
Baldwin, G.L., et al., "The Electronic Conduction Mechanism of Hydrogenated Nanocrystalline Silicon Films", Proc. 4th Int. Conf. on Solid-State and Int. Circuit Tech, Beijing, 66-68, (1995).
Bauer, M., "A Multilevel-Cell 32 Mb Flash Memory", Digest IEEE, Solid-State Circuits Conf.,, 440, (1995).
Boeringer, D.W., et al., "Avalanche amplification of multiple resonant tunneling through parallel silicon microcrystallites", Physical Rev. B, 51, 13337-13343, (1995).
Demichelis, F., et al., "Influence of Doping on the Structural and Optoelectronic Properties of Amorphous and Microcrystalline Silicon Carbide", J. Appl. Phys., vol. 72, 1327-1333, (1992).
Demichelis, F., et al., "Physical Properties of Doped and Undoped Microcrystalline SiC:H Deposited By PECVD", Symp. on Amorphous Silicon Technology, Anaheim, 413-418, (1991).
Dipert, B., et al., "Flash Memory Goes Mainstream", IEEE Spectrum, 30, 48-52, (1993).
Edelberg, E., et al., "Visible Luminescence from Nanocrystalline silicon films produced by plasma enhanced chemical vapor deposition", Appl. Phys. Lett., 68, 1415-1417 (1996).
Hamakawa, Y., et al., "Optoelectronics and Photovoltaic Applications of Microcrystalline SiC", Symp. Materials Issues in Microcrystalline Semi-Conductors, Boston, 291-302, (1989).
Hu, G., "Will Flash Memory Replace Hard Disk Drive?", IEEE Electron Devices Meeting, Session 24, (1994).
Hybertsen, M.S., "Absorption and Emission of Light in Nanoscale Silicon Structures", Phys. Rev. Lett., 72, 1514-1517, (1994).
Jung, T.S., et al., "A 3.3V, 128Mb Multi-Level NAND Flash Memory for Mass Storage Applications", IEEE, 512, (1996).
Kamata, T., et al., "Substrate Current Due to Impact Ionization in MOS-FET", Japan. J. Appl. Phys., vol. 15, 1127-1134, (Jun. 1976).
Kato, M., et al., "Read-Disturb Degradation Mechanism due to Electron Trapping in the Tunnel Oxidee for Low-voltage Flash Memories", IEEE Electron Device Meeting, 45-48, (1994).
Ohkawa, M., et al., "A 98 mm 3.3V 64Mb Flash memory with FN-NOR type 4-Level Cell", IEEE, 512, (1996).
Prendergast, J., "Flash or Dram: Memory Choice for the Future", IEEE Electron Device Meeting, Session 25, (1995).
Schoenfeld, O., et al., "Formation of Si Quantam dots in Nanocrystalline silicon", Proc. 7th Int. Conf. on Modulated Semiconductor Structures, Madrid, 605-608, (1995).
Shimabukuro, R.L., et al., "Circuitry for Artificial Neural Networks with Non-volatile Analog Memories", IEEE, vol. 2, 1217-1220, (1989).
Shimabujkuro, R.L., et al., "Dual-Polarity Nonvolatile MOS Analogue Memory (MAM) Cell for Neural-Type Circuitry", IEEE, vol. 24, 1231-1232, (Sep. 15, 1988).
Suh, K.D., et al., "A 3.3 V 32 Mb NAND Flash Memory with Incremental Step Pulse Programming Scheme", IEEE, vol. 30, 1149-1156, (Nov. 1995).
Sze, S.M., "Physics of Semiconductor Devices", Wiley-Interscience 2d Ed., New York, 482, (1981).
Takeuchi, K., et al., "A Double-Level-V Select Gate Array Architecture for Multilevel NANAD Flash Memories", IEEE Journal of Solid-State Circuits, vol. 31, 602-609, (Apr. 1996).
Tiwari, S., et al., "A silicon nanocrystal based memory", Appl. Physics Lett., 68, 1377-1379, (1996).
Tiwari, S., et al., "Volatile and Non-Volatile Memories in Silicon with Nano-Crystal Storage", Abstract of IEEE Int. Electron Device Meeting, 521-524, (1995).
Tsu, R., et al., "Slow Conductance oscillations in nanoscale silicon clusters of quantum dots", Appl. Phys. Lett., 65, 842-844, (1994).
Tsu, R., et al., "Tunneling in Nanoscale Silicon Particles Embedded in an SiO/sub/2 Matrix", Abstract, IEEE Device Research Conference, 178-179, (1996).
Ye, Q., et al., "Resonant Tunneling via Microcrystalline-silicon quantum confinement", Physical Rev. B, 44, 1806-1811, (1991).
Yih, C.M., et al., "A Consistent Gate and Substrate Current Model for Sub-Micron MOSFET'S by Considering energy Transport", Int'l Symp. on VLSI Tech., Systems and Applic., Taiwan, 127-130, (1995).
Zhao, X., et al., "Nanocrystalline Si: a material contructed by Si quantum dots", 1st Int. Conf. on Low Dimensional Structures and Devices, Singapore, 467-471, (1995).

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