Fault-tolerant anti-reflective coatings

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

350164, 156662, 427162, 427165, 4274193, G02B 110

Patent

active

049664379

ABSTRACT:
A method for producing a narrow band anti-reflective film on a substrate, and the film produced by that method.
Uses the concept of considering a multifilm dielectric to be an equivalent two-film dielectric, then removing a predetermined thickness of the outer, lower dielectric, film to cause the complete multifilm to become anti-reflective.
When limited numbers of film materials are available, uses an EIL or effective index layer concept to obtain a predetermined index of refraction which improves the tolerance of the reflection of an anti-reflective film to film thickness errors.

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