Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-04-26
2011-04-26
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S311000, C430S312000, C430S313000, C430S317000, C568S719000, C568S718000, C568S720000, C568S722000, C568S723000, C568S726000, C568S733000, C549S388000, C549S390000, C549S391000, C560S008000, C560S055000, C560S056000, C560S064000, C560S065000, C560S073000
Reexamination Certificate
active
07932014
ABSTRACT:
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):wherein R1to R8are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.
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Derwent English abstract of JP 61153632 (Isori).
Tokuyuki Honda et al., “What Determines the Ultimate Resolution? The Critical Relationship Between Exposure Tools and Photoresists,” Optical Microlithography XIX, edited by Donis G. Flagello, Proc. of SPIE vol. 6154, 6154221-1-615422-9 (2006) (no month).
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Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Lee Sin J.
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