Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-01-18
2011-01-18
Louie, Wai-Sing (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S329000, C257S330000, C257S342000, C257S349000, C257SE29201
Reexamination Certificate
active
07872308
ABSTRACT:
A semiconductor device includes: a first semiconductor layer of a first conductivity type; a second semiconductor layer of the first conductivity type provided on a main surface of the first semiconductor layer and having a lower impurity concentration than that of the first semiconductor layer; a third semiconductor layer of a second conductivity type provided on the second semiconductor layer; a fourth semiconductor layer of the first conductivity type selectively provided on the third semiconductor layer; a gate electrode provided in a trench passing through the third semiconductor layer and reaching the second semiconductor layer; a first main electrode contacting the fourth semiconductor layer and contacting the third semiconductor layer through a contact groove provided to pass through the fourth semiconductor layer between the contiguous gate electrodes; a second main electrode provided on an opposite surface to the main surface of the first semiconductor layer; and a fifth semiconductor layer of the second conductivity type provided in an interior portion of the second semiconductor layer corresponding to a part under the contact groove. An uppermost portion of the fifth semiconductor layer contacts the third semiconductor layer, a lowermost portion of the fifth semiconductor layer has a higher impurity concentration than that of the other portion in the fifth semiconductor layer and is located in the second semiconductor layer and not contacting the first semiconductor layer, and the fifth semiconductor layer is narrower from the uppermost portion to the lower most portion.
REFERENCES:
patent: 2006/0076614 (2006-04-01), Ninomiya
patent: 2006/0244056 (2006-11-01), Miura
patent: 2007/0114599 (2007-05-01), Hshieh
patent: 2008/0099837 (2008-05-01), Akiyama et al.
patent: 2004-072068 (2004-03-01), None
patent: 2006-179598 (2006-07-01), None
Akiyama Miwako
Kawaguchi Yusuke
Yamaguchi Yoshihiro
Kabushiki Kaisha Toshiba
Louie Wai-Sing
Patterson & Sheridan LLP
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