Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-06-07
2011-06-07
Gurley, Lynne A. (Department: 2811)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S431000, C257S432000, C257S444000, C257SE27133, C257SE27134
Reexamination Certificate
active
07956392
ABSTRACT:
An imaging element comprises: an optical element substrate part in which the imaging element generates a signal charge by photo-electrically converting an incident light applied from one surface side of the optical element substrate part to read the signal charge from the other surface side of the optical element substrate part and picks up an image; and a CMOS circuit substrate part connected to the other surface side of the optical element substrate part so as to transfer the signal charge generated in the photoelectric conversion layer, wherein the optical element substrate part comprises: a photoelectric conversion layer to generate the signal charge by photo-electrically converting the incident light; a charge storage part that stores the signal charge; and a reading transistor that reads the signal charge stored in the charge storage part.
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Maruyama et al., “A back-illuminated high-sensitivity small-pixel color CMOS image sensor with flexible layout of metal wiring,” CMOS ITE Technical Report, vol. 25, pp. 25-28.
Birch Stewart Kolasch & Birch, LLP.
FUJIFILM Corporation
Gurley Lynne A.
Im Junghwa M
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