Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-03-08
2011-03-08
Werner, Brian P (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S151000
Reexamination Certificate
active
07903866
ABSTRACT:
An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
REFERENCES:
patent: 5610715 (1997-03-01), Yoshii et al.
patent: 6208407 (2001-03-01), Loopstra
patent: 6509971 (2003-01-01), Inoue et al.
patent: 6674510 (2004-01-01), Jasper et al.
patent: 6819425 (2004-11-01), Kwan
patent: 7256866 (2007-08-01), Cox et al.
patent: 7348574 (2008-03-01), Pril et al.
patent: 7349069 (2008-03-01), Beems et al.
patent: 7599043 (2009-10-01), Pril et al.
patent: 7768626 (2010-08-01), Shibayama
patent: 7817243 (2010-10-01), Heertjes et al.
patent: 7817248 (2010-10-01), Kwan
patent: 2004/0263846 (2004-12-01), Kwan
patent: 2006/0192976 (2006-08-01), Hall et al.
patent: 2007/0035713 (2007-02-01), Shibayama
patent: 1 760 529 (2007-03-01), None
patent: 05-129184 (1993-05-01), None
patent: 05-335205 (1993-12-01), None
patent: 07-270122 (1995-10-01), None
patent: 10-092732 (1998-04-01), None
patent: 11-008189 (1999-01-01), None
patent: 11-045850 (1999-02-01), None
patent: 2000-269118 (2000-09-01), None
patent: 2000-323404 (2000-11-01), None
patent: 2001-135561 (2001-05-01), None
patent: 2001-513267 (2001-08-01), None
patent: 2002-151405 (2002-05-01), None
patent: 2003-035509 (2003-02-01), None
patent: 2005-512018 (2005-04-01), None
patent: 2005-315426 (2005-11-01), None
patent: 2006-114899 (2006-04-01), None
patent: 2006-303505 (2006-11-01), None
patent: 2006-344685 (2006-12-01), None
patent: 2007-071874 (2007-03-01), None
patent: 2008-543070 (2008-11-01), None
patent: 2007-0026237 (2007-03-01), None
patent: WO 02/079720 (2002-10-01), None
Notification of Reasons for Refusal mailed Aug. 31, 2010 for Korean Patent Application No. 10-2008-0028949, 3 pgs.
English language abstract for JP 05-129184 A, published May 25, 1993; 1 page.
English language abstract for JP 05-335205 A, published Dec. 17, 1993; 1 page.
English language abstract for JP 10-092732 A, published Apr. 10, 1998; 2 pages.
English language abstract for JP 11-008189 A, published Jan. 12, 1999; 2 pages.
English language abstract for JP 11-045850 A, published Feb. 16, 1999; 2 pages.
English language abstract for JP 2000-269118 A, published Sep. 29, 2000; 2 pages.
English language abstract for JP 2001-135561 A, published May 18, 2001; 2 pages.
English translation of Notice for Reasons for Rejection directed to related Japanese Patent Application No. JP 2008-072789, mailed on Nov. 25, 2010 from the Japan Patent Office; 5 pages.
Maria Zaal Koen Jacobus Johannes
Van Der Pasch Engelbertus Antonius Fransiscus
Van Der Wijst Marc Wilhelmus Maria
ASML Netherlands B.V.
Sterne Kessler Goldstein & Fox P.L.L.C.
Werner Brian P
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