Structure inspection method, pattern formation method,...

Optics: measuring and testing – Dimension

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C356S394000, C716S030000

Reexamination Certificate

active

07903264

ABSTRACT:
Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are prepared. Virtual component ratios comprising a mixture ratio of the substances forming the evaluation object and the environment are prepared. Reflectance wavelength dispersions to the virtual component ratios are calculated. Similar reflectance wavelength dispersions having a small difference with the measured wavelength dispersion are extracted from the reflectance wavelength dispersions. Weighted average to the virtual component ratios used for calculating the similar reflectance wavelength dispersions are calculated to obtain a component ratio of the substance forming the evaluation object and the environment so that weighting is larger when the difference is smaller. A structure of the evaluation object is determined from the calculated component ratio.

REFERENCES:
patent: 5523840 (1996-06-01), Nishizawa et al.
patent: 5587792 (1996-12-01), Nishizawa et al.
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6187488 (2001-02-01), Hayasaki et al.
patent: 6423977 (2002-07-01), Hayasaki et al.
patent: 6686130 (2004-02-01), Hayasaki et al.
patent: 6819426 (2004-11-01), Sezginer et al.
patent: 6825938 (2004-11-01), Mikami et al.
patent: 6900892 (2005-05-01), Shchegrov et al.
patent: 6947141 (2005-09-01), Bischoff et al.
patent: 7321426 (2008-01-01), Poslavsky et al.
patent: 2005/0168758 (2005-08-01), Hayasaki et al.
patent: 2001-217291 (2001-08-01), None
patent: 2002-25883 (2002-01-01), None
patent: WO 03/106916 (2003-12-01), None
Notice of Reasons for Rejection mailed by the Japanese Patent Office on Jul. 22, 2008, for Japanese Patent Application No. 2004-021647, and English-language translation thereof.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Structure inspection method, pattern formation method,... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structure inspection method, pattern formation method,..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structure inspection method, pattern formation method,... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2701757

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.