Monomer, resin, resist composition using the resin, and...

Details Monomer, resin, resist composition using the resin, and... Monomer, resin, resist composition using the resin, and...

2011-03-01

2011-03-01

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S910000, C526S256000, C549S013000, C549S028000

Reexamination Certificate

active

07897321

ABSTRACT:
A monomer, which is represented by General Formula I:wherein, each of R1and R3is either —H group or —CH3group, and R1and R3are identical or different to each other; R2is either a phenyl group or an adamanthyl group; and Q1 is a C1-4 perfluoroalkyl group.

REFERENCES:
patent: 7049044 (2006-05-01), Gonsalves et al.
patent: 2007/0111140 (2007-05-01), Hatakeyama et al.
patent: 2007/0123674 (2007-05-01), Yamada et al.
patent: 2007/0149702 (2007-06-01), Ando et al.
patent: 2004-162040 (2004-06-01), None
patent: 2007-161987 (2007-06-01), None
patent: 2007-197718 (2007-08-01), None

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