Lithographic apparatus and device manufacturing method with...

Details Lithographic apparatus and device manufacturing method with... Lithographic apparatus and device manufacturing method with...

2011-03-29

2011-03-29

Young, Christopher G (Department: 1721)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C430S022000

Reexamination Certificate

active

07916276

ABSTRACT:
A device manufacturing method includes a transfer of a pattern from a patterning device onto a substrate. The device manufacturing method further includes transferring a pattern of a main mark to a base layer for forming an alignment mark; depositing a pattern receiving layer on the base layer; in a first lithographic process, aligning, by using the main mark, a first mask that includes a first pattern and a local mark pattern, and transferring the first pattern and the local mark pattern to the pattern receiving layer; aligning, by using the local mark pattern, a second mask including a second pattern relative to the pattern receiving layer; andin a second lithographic process, transferring the second pattern to the pattern receiving layer; the first and second patterns being configured to form an assembled pattern.

REFERENCES:
patent: 5989761 (1999-11-01), Kawakubo et al.
patent: 2002/0028528 (2002-03-01), Ohtaka
patent: 09-007919 (1997-01-01), None
patent: 10-223518 (1998-08-01), None
patent: 11-307449 (1999-11-01), None
patent: 2000-021754 (2000-01-01), None
patent: 2002-100557 (2002-04-01), None
patent: 2003-209049 (2003-07-01), None
Notice of Reasons for Rejection as issued for Japanese Patent Application No. 2007-064287, dated Feb. 8, 2010.

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