Vertical transistor of semiconductor device and method for...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S331000, C257S353000, C257S413000, C257S623000, C257SE29131

Reexamination Certificate

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07994568

ABSTRACT:
A vertical transistor of a semiconductor device and a method for forming the same are disclosed. The vertical transistor comprises a silicon fin disposed on a semiconductor substrate, a source region disposed in the semiconductor substrate below a lower portion of the silicon fin, a drain region disposed in an upper portion of the silicon fin, a channel region disposed in a sidewall of the silicon fin between the source region and the drain region, a gate oxide film disposed in a surface of the semiconductor substrate and the sidewall of the silicon fin, and a pair of gate electrodes disposed on the gate oxide films.

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