Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate
2011-06-07
2011-06-07
Soward, Ida M (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
C257S209000, C257S211000, C257S759000, C257S760000, C257SE21575, C257SE21577, C257SE21579, C257SE21580, C257SE21581, C257SE21583, C257SE21584, C257SE21585, C257SE21592, C257SE21627, C257SE21641
Reexamination Certificate
active
07956466
ABSTRACT:
A design structure is provided for interconnect structures containing various capping materials for electrical fuses and other related applications. The structure includes a first interconnect structure having a first interfacial structure and a second interconnect structure adjacent to the first structure. The second interconnect structure has second interfacial structure different from the first interfacial structure.
REFERENCES:
patent: 5585673 (1996-12-01), Joshi et al.
patent: 5695810 (1997-12-01), Dubin et al.
patent: 5930667 (1999-07-01), Oda
patent: 6225210 (2001-05-01), Ngo et al.
patent: 6323554 (2001-11-01), Joshi et al.
patent: 6342733 (2002-01-01), Hu et al.
patent: 6555458 (2003-04-01), Yu
patent: 6605874 (2003-08-01), Leu et al.
patent: 6706625 (2004-03-01), Sudijono et al.
patent: 6764951 (2004-07-01), van Ngo
patent: 6897144 (2005-05-01), Ngo et al.
patent: 7009222 (2006-03-01), Yang
patent: 7122900 (2006-10-01), Takeda et al.
patent: 7214594 (2007-05-01), Wong et al.
patent: 7239004 (2007-07-01), Park et al.
patent: 7285474 (2007-10-01), Anderson et al.
patent: 7402463 (2008-07-01), Yang et al.
patent: 7439623 (2008-10-01), Harada
patent: 7488682 (2009-02-01), Yang
patent: 7501347 (2009-03-01), Noguchi et al.
patent: 7586196 (2009-09-01), Dubin et al.
patent: 7602027 (2009-10-01), Burke et al.
patent: 7622364 (2009-11-01), Adkisson et al.
patent: 7728432 (2010-06-01), Takewaki et al.
patent: 2001/0030366 (2001-10-01), Nakano et al.
patent: 2003/0001267 (2003-01-01), Watanabe
patent: 2003/0227089 (2003-12-01), Watanabe et al.
patent: 2004/0113279 (2004-06-01), Chen et al.
patent: 2004/0145855 (2004-07-01), Block et al.
patent: 2004/0207092 (2004-10-01), Burrell et al.
patent: 2006/0017153 (2006-01-01), Choi
patent: 2006/0118963 (2006-06-01), Yamada
patent: 2007/0001307 (2007-01-01), Usui et al.
patent: 2007/0161290 (2007-07-01), Fitzsimmons et al.
patent: 2008/0054398 (2008-03-01), Lin et al.
patent: 2008/0206978 (2008-08-01), Hsu et al.
patent: 2009/0174075 (2009-07-01), Yang et al.
patent: 2009/0261450 (2009-10-01), Cheng et al.
Office Action for corresponding U.S. Appl. No. 12/118,161, filed Jun. 29, 2009.
Hsu Louis L.
Tonti William R.
Yang Chih-Chao
Canale Anthony J.
International Business Machines - Corporation
Roberts Mlotkowski Safran & Cole P.C.
Soward Ida M
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