Thin film transistor array panels for a liquid crystal...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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Details

C349S151000, C349S152000, C349S147000

Reexamination Certificate

active

07978292

ABSTRACT:
The invention is directed to simultaneously etching thin films to different uniform depths depending on positions by using a photoresist pattern having different thickness depending on positions as an etch mask in order to form a contact hole for a gate pad along with at least one other layer, or a data wire and a semiconductor pattern, via a single photolithography step.

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