Etchant composition, and method of fabricating metal pattern...

Details Etchant composition, and method of fabricating metal pattern... Etchant composition, and method of fabricating metal pattern...

2011-06-28

2011-06-28

Tran, Binh X (Department: 1713)

Compositions

Etching or brightening compositions

C252S079200, C252S079400, C216S103000, C216S106000

Reexamination Certificate

active

07968000

ABSTRACT:
An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.

REFERENCES:
patent: 4410393 (1983-10-01), Russell et al.
patent: 5885888 (1999-03-01), Konuma et al.
patent: 6159865 (2000-12-01), Kezuka et al.
patent: 2005/0092620 (2005-05-01), Mavliev et al.
patent: 2009/0004863 (2009-01-01), Kamimura

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