Static information storage and retrieval – Systems using particular element – Magnetic thin film
Reexamination Certificate
2011-04-12
2011-04-12
Ho, Hoai V (Department: 2827)
Static information storage and retrieval
Systems using particular element
Magnetic thin film
C365S158000, C365S170000, C365S173000, C365S172000
Reexamination Certificate
active
07924609
ABSTRACT:
A spin valve element driving method, and a spin valve element employing such a method, for causing microwave oscillation in a spin valve element. The spin valve element includes an intermediate layer and a pair of ferromagnetic layers including a fixed layer and a free layer sandwiching the intermediate layer, the fixed layer having a higher coercivity than the free layer, and being magnetized in a direction substantially perpendicular to a film plane thereof. The method includes a driving step of passing current from one of the pair of ferromagnetic layers to the other through the intermediate layer.
REFERENCES:
patent: 6483741 (2002-11-01), Iwasaki et al.
patent: 2005/0034017 (2005-02-01), Airaud et al.
patent: 2005/0219771 (2005-10-01), Sato et al.
patent: 2001-084756 (2001-03-01), None
patent: 2007-124340 (2007-05-01), None
patent: WO-2006-101040 (2006-09-01), None
Yoshishige Suzuki et al., “Microwave Properties of Spin Injection Device—Spontaneous Oscillation, Spin-Torque Diode Effect and Magnetic Noise”, Magnetics Japan, Jun. 1, 2007, vol. 2, No. 6, pp. 282 to 290. Cited in Intl Search Report.
Kawakami Haruo
Ogimoto Yasushi
Fuji Electric Holdings Co., Ltd.
Hidalgo Fernando N
Ho Hoai V
Rabin & Berdo P.C.
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