Method for manufacturing pixel structure

Details Method for manufacturing pixel structure Method for manufacturing pixel structure

2011-08-30

2011-08-30

Mulpuri, Savitr (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C257SE21535

Reexamination Certificate

active

08008135

ABSTRACT:
A method for manufacturing a pixel structure includes providing a substrate having an active device thereon and forming a dielectric layer covering the active device. The dielectric layer has a contact hole disposed over the active device. Next, a first photoresist layer is formed on the dielectric layer over the active device, and a transparent conductive layer is formed to cover a portion of the dielectric layer and the first photoresist layer. The transparent conductive layer is electrically connected to the active device via the contact hole. Besides, the transparent conductive layer is irradiated with use of a laser beam, and a portion of the transparent conductive layer on the first photoresist layer is removed, such that the other portion of the transparent conductive layer on the portion of the dielectric layer forms a pixel electrode. The first patterned photoresist layer is then removed.

REFERENCES:
patent: 5580473 (1996-12-01), Shinohara et al.
patent: 2006/0145161 (2006-07-01), Lee et al.

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