Multi-station deposition apparatus and method

Details Multi-station deposition apparatus and method Multi-station deposition apparatus and method

2011-04-12

2011-04-12

Culbert, Roberts (Department: 1716)

Coating processes

Coating by vapor, gas, or smoke

C427S255280, C427S251000, C427S255500

Reexamination Certificate

active

07923069

ABSTRACT:
A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates the wafers into specific deposition positions at which deposition gases are supplied to the wafers. The deposition gases may be supplied to the wafer through single zone or multi-zone gas dispensing nozzles.

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