Process monitoring apparatus and method for monitoring process

Details Process monitoring apparatus and method for monitoring process Process monitoring apparatus and method for monitoring process

2011-08-30

2011-08-30

Roman, Angel (Department: 2812)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C700S112000, C700S121000, C700S123000

Reexamination Certificate

active

08010228

ABSTRACT:
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.

REFERENCES:
patent: 5294572 (1994-03-01), Granneman et al.
patent: 5444637 (1995-08-01), Smesny et al.
patent: 5746835 (1998-05-01), Turner et al.
patent: 5969639 (1999-10-01), Lauf et al.
patent: 6102284 (2000-08-01), Myers et al.
patent: 6244121 (2001-06-01), Hunter
patent: 6288561 (2001-09-01), Leedy
patent: 6352466 (2002-03-01), Moore
patent: 6480699 (2002-11-01), Lovoi
patent: 6553277 (2003-04-01), Yagisawa et al.
patent: 6576922 (2003-06-01), Ma et al.
patent: 6607965 (2003-08-01), Moradi et al.
patent: 6614051 (2003-09-01), Ma
patent: 6727994 (2004-04-01), Hsieh et al.
patent: 6773158 (2004-08-01), Koshimizu
patent: 6830650 (2004-12-01), Roche et al.
patent: 6889568 (2005-05-01), Renken
patent: 2002/0134506 (2002-09-01), Franklin et al.
patent: 2004/0007326 (2004-01-01), Roche et al.
patent: 2004/0128021 (2004-07-01), Klekotka
patent: 06-76193 (1994-03-01), None
patent: 2001-242014 (2001-09-01), None
patent: 2002-170925 (2002-06-01), None
patent: WO 00/68986 (2000-11-01), None
Chinese Office Action dated Mar. 17, 2010.

Affiliated with

Also associated with

Rating

Process monitoring apparatus and method for monitoring process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process monitoring apparatus and method for monitoring process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process monitoring apparatus and method for monitoring process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2670250