Measurement of EUV intensity

Details Measurement of EUV intensity Measurement of EUV intensity

2011-03-29

2011-03-29

Glick, Edward J (Department: 2882)

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C355S063000

Reexamination Certificate

active

07916274

ABSTRACT:
A monitoring system for an lithographic system that may be utilized in an extreme ultraviolet lithographic system is disclosed. In a monitoring system according to the present invention, a plurality of detectors are positioned to receive radiation from a pattern of positions on a mirror that is part of the lithographic system. In some embodiments, the plurality of detectors may be positioned on the mirror. In some embodiments, the plurality of detectors may be positioned behind the mirror and receive radiation through holes formed in the mirror. In some embodiments, radiation from the pattern of positions may be reflected by facets into the detectors.

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patent: 2004/0227922 (2004-11-01), Dierichs et al.
patent: 2004/0239907 (2004-12-01), Hintersteiner et al.
patent: 2003-224053 (2003-08-01), None

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